Antifouling composition, treatment device, treatment method, and treated article

ABSTRACT

The present invention provides a surface-treating agent comprising a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal as a group of —Y-A wherein Y is a single bond, an oxygen atom or a divalent organic group, and A is —CH═CH 2  or —C≡CH, which is able to form a layer having higher alkaline resistance.

TECHNICAL FIELD

The present invention relates to a surface-treating agent or an antifouling composition comprising a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal.

BACKGROUND ART

A certain fluorine-containing silane compound is known to be able to provide excellent water-repellency, oil-repellency, antifouling property, or the like when it is used in a surface treatment of a base material. A layer (hereinafter, referred to as a “surface-treating layer”) formed from a surface-treating agent comprising a fluorine-containing silane compound is applied to various base materials such as a glass, a plastic, a fiber and a building material as a so-called functional thin film.

As such fluorine-containing silane compound, a perfluoropolyether group containing silane compound which has a perfluoropolyether group in its molecular main chain and a hydrolyzable group bonding to a Si atom in its molecular terminal or terminal portion is known (see Patent Documents 1 and 2). When the surface-treating agent comprising the perfluoropolyether group containing silane compound is applied on a base material, a reaction of the hydrolyzable group bonding to a Si atom between the compound and the base material and between the compounds is occurred to form the surface-treating layer.

PRIOR ART DOCUMENT Patent Document

Patent Document 1: JP 2008-534696 A

Patent Document 2: International Publication No. 97/07155

SUMMARY OF THE INVENTION Problem to be Solved by the Invention

However, since the surface-treating layer as described above is bonded to the base material by —Si—O—Si— bond, there is a possibility that the bond is cleaved and the durability is decreased under an alkaline environment, particularly a strong alkaline environment, for example when perspiration is contacted to the base material.

Therefore, an object of the present invention is to provide a novel surface-treating agent which is able to form a layer having higher alkali resistance.

Means to Solve the Problem

As a result of intensively studying, the inventors of the present invention have found that the surface-treating layer having higher alkali resistance can be formed by introducing a carbon-carbon unsaturated bond into a molecular terminal of the fluorine-containing compound and reacting it with a Si—H bond or a C—H bond of the base material to bond between the base material and the surface-treating layer by a Si—C bond or a C—C bond, and the inventors have reached the present invention.

Therefore, according to the first aspect of the present invention, there is provided a surface-treating agent comprising a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal as a group of —Y-A wherein Y is a single bond, an oxygen atom or a divalent organic group, and A is —CH═CH₂ or —C≡CH.

According to the second aspect of the present invention, there is provided an article comprising a base material and a layer which is formed on a surface of the base material from the surface-treating agent of the present invention.

According to the third aspect of the present invention, there is provided a method for forming a surface-treating layer on a surface of a base material comprising the steps of:

performing a pretreatment of the base material so as to form a binding site with a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal on the surface of the base material; and

applying the surface-treating agent according of the present invention to the base material subjected to the pretreatment to form the surface-treating layer on the surface of the base material.

According to the fourth aspect of the present invention, there is provided a surface-treating layer forming apparatus for forming a surface-treating layer on a surface of the base material comprising:

a pretreatment unit for performing a pretreatment of the base material to form a binding site with a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal on the surface of the base material, and

a surface-treating layer forming unit for applying the surface-treating agent of the present invention to the base material subjected to the pretreatment to form the surface-treating layer on the surface of the base material.

According to the fifth aspect of the present invention, there is provided a process for producing an article comprising a base material and a surface-treating layer coating a surface of the base material comprising a step of:

contacting the surface-treating agent of the present invention to the surface of the base material so that the fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal contained in the surface-treating agent is reacted with a Si—H part or a C—H part of the surface of the base material to form the surface-treating layer on the surface of the base material.

Effect of the Invention

According to the surface-treating agent comprising a fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal of the present invention, the surface-treating layer having high alkali resistance can be formed.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a block diagram showing one embodiment of a surface-treating layer forming apparatus for forming the surface-treating layer on a base material.

FIG. 2 is a cross-sectional view schematically showing one embodiment of the pretreatment unit 200 in the surface-treating layer forming apparatus shown in FIG. 1.

EMBODIMENTS TO CARRY OUT THE INVENTION

Hereinafter, the surface-treating agent of the present invention will be described.

The “2-10 valent organic group” as used herein represents a 2-10 valent group containing a carbon atom. Examples of the 2-10 valent organic group include, but are not particularly limited to, a 2-10 valent group obtained by removing 2-9 hydrogen atoms from a hydrocarbon group. For example, examples of the 2-10 valent organic group include, but are not particularly limited to, a divalent group obtained by removing one hydrogen atom from a hydrocarbon group from a hydrocarbon group.

The “hydrocarbon group” as used herein represents a group containing a carbon atom and a hydrogen atom. Examples of the hydrocarbon group include, but are not particularly limited to, a hydrocarbon group having 1-20 carbon atoms which may be substituted by one or more substituents, for example, an aliphatic hydrocarbon group, an aromatic hydrocarbon group, and the like. The “aliphatic hydrocarbon group” may be straight, branched or cyclic, and may be saturated or unsaturated. The hydrocarbon group may contain one or more ring structures. It is noted that the hydrocarbon group may have one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, carbonyloxy, or the like at its end or in its molecular chain.

As used herein, examples of the substituent of the “hydrocarbon group” include, but are not particularly limited to, for example a halogen atom; and a C₁₋₆ alkyl group, a C₂₋₆ alkenyl group, a C₂₋₆ alkynyl group, a C₃₋₁₀ cycloalkyl group, a C₃₋₁₀ unsaturated cycloalkyl group, a 5-10 membered heterocyclyl group, a 5-10 membered unsaturated heterocyclyl group, a C₆₋₁₀ aryl group, a 5-10 membered heteroaryl group, and the like, which may be substituted by one or more halogen atoms.

The present invention provides the surface-treating agent comprising a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal as a group of —Y-A wherein Y is a single bond, an oxygen atom or a divalent organic group, and A is —CH═CH₂ or —C≡CH.

Y is a single bond, an oxygen atom or a divalent organic group. Y is preferably a single bond, an oxygen atom or —CR¹⁴ ₂—.

R¹⁴ is each independently at each occurrence a hydrogen atom or a lower alkyl group. The lower alkyl group is preferably an alkyl group having 1-20 carbon atoms, more preferably an alkyl group having 1-6 carbon atoms, further preferably a methyl group. R¹⁴ is preferably a hydrogen atom.

A is —CH═CH₂ or —C≡CH. A is preferably —CH═CH₂.

In a preferably embodiment, the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal may be a compound of any of the following formulae (A1), (A2), (B1), (B2), (C1), (C2), (D1) and (D2):

Hereinafter, the formulae (A1), (A2), (B1), (B2), (C1), (C2), (D1) and (D2) described above are described.

Formulae (A1) and (A2):

In the formula, Rf is an alkyl group having 1-16 carbon atoms which may be substituted by one or more fluorine atoms.

The “alkyl group having 1-16 carbon atoms” in the alkyl having 1-16 carbon atoms which may be substituted by one or more fluorine atoms may be straight or branched, and preferably is a straight or branched alkyl group having 1-6 carbon atoms, in particular 1-3 carbon atoms, more preferably a straight alkyl group having 1-3 carbon atoms.

Rf is preferably an alkyl having 1-16 carbon atoms substituted by one or more fluorine atoms, more preferably a CF₂H—C₁₋₁₅ perfluoroalkylene group, more preferably a perfluoroalkyl group having 1-16 carbon atoms.

The perfluoroalkyl group having 1-16 carbon atoms may be straight or branched, and preferably is a straight or branched perfluoroalkyl group having 1-6 carbon atoms, in particular 1-3 carbon atoms, more preferably a straight perfluoroalkyl group having 1-3 carbon atoms, specifically —CF₃, —CF₂CF₃ or —CF₂CF₂CF₃.

In the formula, PFPE is —(OC₄F₈)_(a)—(OC₃F₆)_(b)—(OC₂F₄)_(c)—(OCF₂)_(d)—, and corresponds to a perfluoro(poly)ether group. Here, a, b, c and d are each independently 0 or an integer of 1 or more and are not particularly limited as long as the sum of a, b, c and d is 1 or more. Preferably, a, b, c and d are each independently an integer of 0 or more and 200 or less, for example an integer of 1 or more and 200 or less, more preferably each independently an integer of 0 or more and 100 or less, for example, an integer of 1 or more and 100 or less. More preferably, the sum of a, b, c and d is 10 or more, preferably 20 or more, and 200 or less, preferably 100 or less. The occurrence order of the respective repeating units in parentheses with the subscript a, b, c or d is not limited in the formula. Among these repeating units, the —(OC₄F₈)— group may be any of —(OCF₂CF₂CF₂CF₂)—, —(OCF(CF₃)CF₂CF₂)—, —(OCF₂CF(CF₃)CF₂)—, —(OCF₂CF₂CF(CF₃))—, —(OC(CF₃)₂CF₂)—, —(OCF₂C(CF₃)₂)—, —(OCF(CF₃)CF(CF₃))—, —(OCF(C₂F₅)CF₂)— and —(OCF₂CF(C₂F₅))—, preferably —(OCF₂CF₂CF₂CF₂)—. The —(OC₃F₆)— group may be any of —(OCF₂CF₂CF₂)—, —(OCF(CF₃)CF₂)— and —(OCF₂CF(CF₃))—, preferably —(OCF₂CF₂CF₂)—. The —(OC₂F₄)— group may be any of —(OCF₂CF₂)— and —(OCF(CF₃))—, preferably —(OCF₂CF₂)—.

In one embodiment, PFPE is —(OC₃F₆)_(b)— wherein b is an integer of 1 or more and 200 or less, preferably 10 or more and 100 or less, preferably —(OCF₂CF₂CF₂)_(b)— wherein b is as defined above.

In another embodiment, PFPE is —(OC₄F₈)_(a)—(OC₃F₆)_(b)—(OC₂F₄)_(c)—(OCF₂)_(d)— wherein a and b are each independently an integer of 0 or more, or 1 or more and 30 or less, preferably 0 or more and 10 or less, and c and d are each independently an integer of 1 or more and 200 or less, preferably 10 or more and 100 or less. The sum of a, b, c and d is 10 or more, preferably 20 or more and 200 or less, preferably 100 or less. The occurrence order of the respective repeating units in parentheses with the subscript a, b, c or d is not limited in the formula. Preferably, PFPE is —(OCF₂CF₂CF₂CF₂)_(a)—(OCF₂CF₂CF₂)_(b)—(OCF₂CF₂)_(c)—(OCF₂)_(d)— wherein a, b, c and d are as defined above. For example, PFPE may be —(OCF₂CF₂)_(c)—(OCF₂)_(d)— wherein c and d are as defined above.

In another embodiment, PFPE is —(OC₂F₄—R¹⁵)_(n″)—. In the formula, R¹⁵ is a group selected from OC₂F₄, OC₃F₆ and OC₄F₈, or a combination of 2 or 3 groups independently selected from these groups. Examples of the combination of 2 or 3 groups independently selected from OC₂F₄, OC₃F₆ and OC₄F₈ include, but not particularly limited to, for example, —OC₂F₄OC₃F₆—, —OC₂F₄OC₄F₈—, —OC₃F₆OC₂F₄—, —OC₃F₆OC₃F₆—, —OC₃F₆OC₄F₈—, —OC₄F₈OC₄F₈—, —OC₄F₈OC₃F₆—, —OC₄F₈OC₂F₄—, —OC₂F₄OC₂F₄OC₃F₆—, —OC₂F₄OC₂F₄OC₄F₈—, —OC₂F₄OC₃F₆OC₂F₄—, —OC₂F₄OC₃F₆OC₃F₆—, —OC₂F₄OC₄F₈OC₂F₄—, —OC₃F₆OC₂F₄OC₂F₄—, —OC₃F₆OC₂F₄OC₃F₆—, —OC₃F₆OC₃F₆OC₂F₄—, —OC₄F₈OC₂F₄OC₂F₄—, and the like. n″ is an integer of 2-100, preferably an integer of 2-50. In the above-mentioned formula, OC₂F₄, OC₃F₆ and OC₄F₈ may be straight or branched, preferably straight. In this embodiment, PFPE is preferably —(OC₂F₄—OC₃F₆)_(n″)— or —(OC₂F₄—OC₄F₈)_(n″)—.

In the formula, R¹¹ is each independently at each occurrence a hydrogen atom or a halogen atom. The halogen atom is preferably an iodine atom, a chlorine atom, a fluorine atom.

In the formula, R¹² is each independently at each occurrence a hydrogen atom or a lower alkyl group. The lower alkyl group is preferably an alkyl group having 1-20 carbon atoms, more preferably an alkyl group having 1-6 carbon atoms.

In the formulae (A1) and (A2), X¹ is each independently a single bond or a 2-10 valent organic group. The X¹ group is recognized to be a linker which connects between a perfluoropolyether moiety (an Rf-PFPE moiety or -PFPE-moiety) providing mainly water-repellency, surface slip property and the like and a group having a carbon-carbon unsaturated bond (specifically, the A group or a group containing the A group) providing an ability to bind to a base material in the compound of the formula (A1) and (A2). Therefore, the X¹ group may be any organic group as long as the compound of the formula (A1) and (A2) can stably exist.

In the formula, α is an integer of 1-9, and α′ is an integer of 1-9. α and α′ are determined depending on the valence number of the X¹ group. In the formula (A1), the sum of α and α′ is the valence number of the X¹ group. For example, when X¹ is a 10 valent organic group, the sum of α and α′ is 10, for example, α is 9 and α′ is 1, α is 5 and α′ is 5, or α is 1 and α′ is 9. When X¹ is a divalent organic group, α and α′ are 1. In the formula (A2), α is a value obtained by subtracting 1 from the valence number of the X¹ group.

X¹ is preferably a 2-7 valent, more preferably 2-4 valent, more preferably a divalent organic group.

Examples of X¹ include, but are not particularly limited to, for example a divalent group of the following formula:

—(R³¹)_(p′)—(X^(a))_(q′)—R³²—

wherein:

R³¹ is a single bond, —(CH₂)_(s′)— or an o-, m- or p-phenylene group, preferably —(CH₂)_(s′)—,

R³² is a single bond, —(CH₂)_(t′)— or an o-, m- or p-phenylene group, preferably —(CH₂)_(t′)—,

s′ is an integer of 1-20, preferably an integer of 1-6, more preferably an integer of 1-3, further more preferably 1 or 2,

t′ is an integer of 1-20, preferably an integer of 2-6, more preferably an integer of 2-3,

X^(a) is —(X^(b))_(r′)—,

X^(b) is each independently at each occurrence a group selected from the group consisting of —O—, —S—, an o-, m- or p-phenylene group, —C(O)O—, —CONR³⁴—, —O—CONR³⁴—, —NR³⁴—, —Si(R³³)₂—, —(Si(R³³)₂O)_(m′)—Si(R³³)₂—, and —(CH₂)_(n′)—,

R³³ is each independently at each occurrence a phenyl group, a C₁₋₆ alkyl group or a C₁₋₆ alkoxy group, preferably a C₁₋₆ alkyl group, more preferably a methyl group,

R³⁴ is each independently at each occurrence a hydrogen atom, a phenyl group or a C₁₋₆ alkyl group (preferably a methyl group),

m′ is each independently an integer of 1-100, preferably an integer of 1-20,

n′ is each independently at each occurrence an integer of 1-20, preferably an integer of 1-6, more preferably an integer of 1-3,

r′ is an integer of 1-10, preferably an integer of 1-5, more preferably an integer of 1-3,

p′ is 0 or 1, and

q′ is 0 or 1,

at least one of p′ and q′ is 1, and the occurrence order of the respective repeating units in parentheses with the subscript p′ or q′ is not limited in the formula.

Preferably, X¹ may be

a C₁₋₂₀ alkylene group, —R³¹—X^(c)—R³²—, or —X^(d)—R³²— wherein R³¹ and R³² are as defined above.

More preferably, X¹ may be,

a C₁₋₂₀ alkylene group, —(CH₂)_(s′)—X—, —(CH₂)_(s′)—X^(c)—(CH₂)_(t′)—

—X^(d)—, or

—X^(d)—(CH₂)_(t′)— wherein s′ and t′ are as defined above.

In the formula, X^(c) is

—O—, —S—, —C(O)O—, —CONR³⁴—, —O—CONR³⁴—,

—Si(R³³)₂—, —(Si(R³³)₂O)_(m′)—Si(R³³)₂—, —O—(CH₂)_(u′)—(Si(R³³)₂O)_(m′)—Si(R³³)₂—, —CONR³⁴—(CH₂)_(u′)—(Si(R³³)₂O)_(m′)—Si(R³³)₂—, —CONR³⁴—(CH₂)_(u′)—N(R³⁴)—, or —CONR³⁴— (o-, m- or p-phenylene)-Si(R³³)₂— wherein R³³, R³⁴ and m′ are as defined above, u′ is an integer of 1-20, preferably an integer of 2-6, more preferably an integer of 2-3. X^(c) is preferably —O—.

In the formula, X^(d) is

—S—, —C(O)O—, —CONR³⁴—,

—CONR³⁴—(CH₂)_(u′)—(Si(R³³)₂O)_(m′)—Si(R³³)₂—, —CONR³⁴—(CH₂)_(u′)—N(R³⁴)—, or —CONR³⁴— (o-, m- or p-phenylene)-Si(R³³)₂—.

More preferably, X¹ may be

a C₁₋₂₀ alkylene group, —(CH₂)_(s′)—X^(c)—(CH₂)_(t′)—, or —X^(d)—(CH₂)_(t′)— wherein each symbol is as defined above.

Further, more preferably, X¹ is

a C₁₋₂₀ alkylene group, —(CH₂)_(s′)—O—(CH₂)_(t′)—, —(CH₂)_(s′)—Si(R³³)₂—(CH₂)_(t′)—, —(CH₂)_(s′)—(Si(R³³)₂O)_(m′)—Si(R³³)₂—(CH₂)_(t′)—, —(CH₂)_(s′)—O—(CH₂)_(u′)—(Si(R³³)₂O)_(m′)—Si(R³³)₂—(CH₂)_(t′)—, or —(CH₂)_(s′)—O—(CH₂)_(t′)—Si(R³³)₂—(CH₂)_(u′)—Si(R³³)₂—(C_(v)H_(2v))— wherein each symbol is as defined above, v is an integer of 1-20, preferably an integer of 2-6, more preferably an integer of 2-3.

In the formula, —(C_(v)H_(2v))— may be straight or branched, and may be for example —CH₂CH₂—, —CH₂CH₂CH₂—, —CH(CH₃)—, or —CH(CH₃)CH₂—.

The above-mentioned X¹ group may be substituted by one or more substituents selected from a fluorine atom, a C₁₋₃ alkyl group and a C₁₋₃ fluoroalkyl group (preferably, a C₁₋₃ perfluoroalkyl group).

Specific examples of X¹ include, for example:

—CH₂O(CH₂)₂—, —CH₂O(CH₂)₃—, —CH₂O(CH₂)₆—, —CH₂O(CH₂)₃Si(CH₃)₂OSi(CH₃)₂(CH₂)₂—, —CH₂O(CH₂)₃Si(CH₃)₂OSi(CH₃)₂OSi(CH₃)₂(CH₂)₂—, —CH₂O(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₂Si(CH₃)₂(CH₂)₂—, —CH₂O(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₃Si(CH₃)₂(CH₂)₂—, —CH₂O(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₁₀Si(CH₃)₂(CH₂)₂—, —CH₂O(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₂₀Si(CH₃)₂(CH₂)₂—, —CH₂OCF₂CHFOCF₂—, —CH₂OCF₂CHFOCF₂CF₂—, —CH₂OCF₂CHFOCF₂CF₂CF₂—, —CH₂OCH₂CF₂CF₂OCF₂—, —CH₂OCH₂CF₂CF₂OCF₂CF₂—, —CH₂OCH₂CF₂CF₂OCF₂CF₂CF₂—, —CH₂OCH₂CF₂CF₂OCF(CF₃)CF₂OCF₂—, —CH₂OCH₂CF₂CF₂OCF(CF₃)CF₂OCF₂CF₂—, —CH₂OCH₂CF₂CF₂OCF(CF₃)CF₂OCF₂CF₂CF₂—, —CH₂OCH₂CHFCF₂OCF₂—, —CH₂OCH₂CHFCF₂OCF₂CF₂—, —CH₂OCH₂CHFCF₂OCF₂CF₂CF₂—, —CH₂OCH₂CHFCF₂OCF(CF₃)CF₂OCF₂—, —CH₂OCH₂CHFCF₂OCF(CF₃)CF₂OCF₂CF₂—, —CH₂OCH₂CHFCF₂OCF(CF₃)CF₂OCF₂CF₂CF₂— —CH₂OCH₂ (CH₂)₇CH₂Si(OCH₃)₂OSi(OCH₃)₂(CH₂)₂Si(OCH₃)₂OSi(OCH₃)₂(CH₂)₂—, —CH₂OCH₂CH₂CH₂Si(OCH₃)₂OSi(OCH₃)₂(CH₂)₃—, —(CH₂)₂—, —(CH₂)₃—, —(CH₂)₄—, —(CH₂)₆—, —(CH₂)₂—Si(CH₃)₂—(CH₂)₂— —CONH—(CH₂)₃—, —CON(CH₃)—(CH₂)₃—, —CON(Ph)-(CH₂)₃— (wherein Ph is phenyl), —CONH—(CH₂)₆—, —CON(CH₃)—(CH₂)₆—, —CON(Ph)-(CH₂)₆— (wherein Ph is phenyl), —CONH—(CH₂)₂NH(CH₂)₃—, —CONH—(CH₂)₆NH(CH₂)₃—, —CH₂O—CONH—(CH₂)₃—, —CH₂O—CONH—(CH₂)₆—, —S—(CH₂)₃—, —(CH₂)₂S(CH₂)₃—, —CONH—(CH₂)₃Si(CH₃)₂OSi(CH₃)₂(CH₂)₂—, —CONH—(CH₂)₃Si(CH₃)₂OSi(CH₃)₂OSi(CH₃)₂(CH₂)₂—, —CONH—(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₂Si(CH₃)₂(CH₂)₂—, —CONH—(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₃Si(CH₃)₂(CH₂)₂—, —CONH—(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₁₀Si(CH₃)₂(CH₂)₂—, —CONH—(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₂₀Si(CH₃)₂(CH₂)₂— —C(O)O—(CH₂)₃—, —C(O)O—(CH₂)₆—, —CH₂—O—(CH₂)₃—Si(CH₃)₂—(CH₂)₂—Si(CH₃)₂—(CH₂)₂—, —CH₂—O—(CH₂)₃—Si(CH₃)₂—(CH₂)₂—Si(CH₃)₂—CH(CH₃)—, —CH₂—O—(CH₂)₃—Si(CH₃)₂—(CH₂)₂—Si(CH₃)₂—(CH₂)₃—, —CH₂—O—(CH₂)₃—Si(CH₃)₂—(CH₂)₂—Si(CH₃)₂—CH(CH₃)—CH₂—,

and the like.

Other examples of the X¹ include, for example the following groups:

wherein R⁴¹ is each independently a hydrogen atom, a phenyl group, an alkyl group having 1-6 carbon atoms, or a C₁₋₆ alkoxy group, preferably a methyl group;

D is a group selected from

—CH₂O(CH₂)₂—, —CH₂O(CH₂)₃—, —CF₂O(CH₂)₃—, —(CH₂)₂—, —(CH₂)₃—, —(CH₂)₄—, —CONH—(CH₂)₃—, —CON(CH₃)—(CH₂)₃—, —CON(Ph)-(CH₂)₃— (wherein Ph is a phenyl group), and

wherein R⁴² is each independently a hydrogen atom, a C₁₋₆ alkyl group or a C₁₋₆ alkoxy group, preferably a methyl group or a methoxy group, more preferably a methyl group,

E is —(CH₂)_(n)— wherein n is an integer of 2-6,

D binds to PFPE of the main backbone, and E binds to a group opposite to PFPE.

Further other examples of the X¹ group include the following groups:

wherein R⁴¹ is each independently a hydrogen atom, a phenyl group, an alkyl group having 1-6 carbon atoms, or a C₁₋₆ alkoxy group, preferably a methyl group;

in each X¹ group, any one of T is a following group which binds to PFPE of the main backbone:

—CH₂O(CH₂)₂—, —CH₂O(CH₂)₃—, —CF₂O(CH₂)₃—, —(CH₂)₂—, —(CH₂)₃—, —(CH₂)₄—, —CONH—(CH₂)₃—, —CON(CH₃)—(CH₂)₃—, —CON(Ph)-(CH₂)₃— wherein Ph is phenyl, or

wherein R⁴² is each independently a hydrogen atom, a C₁₋₆ alkyl group or a C₁₋₆ alkoxy group, preferably a methyl group or a methoxy group, more preferably a methyl group,

at least one of the other T is —(CH₂)_(n″)— (wherein n″ is an integer of 2-6) attached to the group opposite to PFPE, and

the others are each independently a methyl group or a phenyl group, if any.

In other embodiment, X¹ is a group of the formula: —(R¹⁶)_(x)—(CFR¹⁷)_(y)—(CH₂)_(z)—. In the formula, x, y and z are each independently an integer of 0-10, the sum of x, y and z is 1, and the occurrence order of the respective repeating units in parentheses is not limited in the formula.

In the formula, R¹⁶ is each independently at each occurrence an oxygen atom, phenylene, carbazolylene, —NR²⁰— wherein R²⁰ is a hydrogen atom or an organic group) or a divalent organic group. Preferably, R¹⁶ is an oxygen atom or a divalent polar group.

Examples of the “divalent polar group” in Q include, but are not particularly limited to, —C(O)—, —C(═NR²¹)—, and —C(O)NR²¹— wherein R²¹ is a hydrogen atom or a lower alkyl group. The “lower alkyl group” is, for example, an alkyl group having 1-6 carbon atoms, for example, methyl, ethyl, n-propyl, which may be substituted by one or more fluorine atoms.

In the formula, R¹⁷ is each independently at each occurrence a hydrogen atom, a fluorine atom or a lower fluoroalkyl group, preferably a fluorine atom. The “lower fluoroalkyl group” is, for example, preferably a fluoroalkyl group having 1-6 carbon atoms, preferably 1-3 carbon atoms, preferably a perfluoroalkyl group having 1-3 carbon atoms, more preferably a trifluoromethyl group, and a pentafluoroethyl group, further preferably a trifluoromethyl group.

In this embodiment, X¹ is preferably is a group of the formula: —(O)_(x)—(CF₂)_(y)—(CH₂)_(z)— wherein x, y and z are as defined above, and the occurrence order of the respective repeating units in parentheses is not limited in the formula.

Examples of the group of the formula: —(O)_(x)—(CF₂)_(y)—(CH₂)_(z)— include, for example, —(O)_(x′)—(CH₂)_(z″)—O—[(CH₂)_(z′″)—O-]_(z″″), and —(O)_(x′)—(CF₂)_(y″)—(CH₂)_(z″)—O—[(CH₂)_(z′″)—O-]_(z″″) wherein x′ is 0 or 1, y″, z″ and z′″ are each independently an integer of 1-10, and z″″ is 0 or 1. It is noted that these groups are attached to PFPE at its left side terminal.

In another embodiment, X¹ is —O—CFR¹³—(CF₂)_(e)—.

R¹³ is each independently a fluorine atom or a lower fluoroalkyl group. The lower fluoroalkyl group is, for example, a fluoroalkyl group having 1-3 carbon atoms, preferably a perfluoroalkyl group having 1-3 carbon atoms, more preferably a trifluoromethyl group, and a pentafluoroethyl group, further preferably a trifluoromethyl group.

“e” is each independently 0 or 1.

In one embodiment, R¹³ is a fluorine atom, and e is 1.

In the formula, t is each independently an integer of 1-10, preferably an integer of 1-6.

In the formula, X² is each independently at each occurrence a single bond or a divalent organic group. X² is preferably an alkylene group having 1-20 carbon atoms, more preferably, —(CH₂)_(u)— wherein u is an integer of 0-2.

The compound of the formulae (A1) and (A2) can be obtained, for example, by introducing an iodine into a terminal of a perfluoropolyether derivative corresponding to the Rf-PFPE-moiety as a raw material, and reacting it with a vinyl monomer corresponding to —CH₂CR¹²(X²YA)-.

Alternatively, the compound can be produced by synthesizing a compound having a precursor group corresponding to the Y-A moiety, and converting the precursor to the Y-A moiety by using a method known in the art.

The method for converting is not particularly limited. For example, a known reaction for forming a carbon-carbon unsaturated bond, for example an elimination reaction such as dehydration reaction or dehydrohalogenation reaction, or a known method for adding a compound having a carbon-carbon unsaturated bond to a terminal of the molecular corresponding to the Y-A moiety or substituting the terminal by the compound having a carbon-carbon unsaturated bond can be used. Those skilled in the art can select a suitable reaction and its reaction condition depending on a structure of the compound.

Formula (B1) and (B2):

(Rf-PFPE)_(β′)—X³—(Y-A)_(β)  (B1)

(A-Y)_(β)—X³-PFPE-X³—(Y-A)_(β)  (B2)

In the formulae (B1) and (B2), Rf, PFPE, Y and A are as defined for the formulae (A1) and (A2).

In the formula, X³ is each independently a single bond or a 2-10 valent organic group. The X³ group is recognized to be a linker which connects between a perfluoropolyether moiety (an Rf-PFPE moiety or -PFPE-moiety) providing mainly water-repellency, surface slip property and the like and a group having a carbon-carbon unsaturated bond (specifically, the A group or a group containing the A group) providing an ability to bind to a base material in the compound of the formula (B1) and (B2). Therefore, the X³ group may be any organic group as long as the compound of the formula (B1) and (B2) can stably exist.

In the formula, β is an integer of 1-9, and β′ is an integer of 1-9. β and β′ are determined depending on the valence number of the X³ group. In the formula (B1), the sum of β and β′ is the valence number of the X³ group. For example, when X³ is a 10 valent organic group, the sum of β and β′ is 10, for example, β is 9 and β′ is 1, β is 5 and β′ is 5, or β is 1 and β′ is 9. When X³ is a divalent organic group, β and β′ are 1. In the formula (B2), β is a value obtained by subtracting 1 from the valence number of the X³ group.

X³ is preferably a 2-7 valent, more preferably 2-4 valent, more preferably a divalent organic group.

Examples of X³ include, but are not particularly limited to, the same groups as that for X¹.

The compound of the formulae (B1) and (B2) can be obtained, for example, by introducing a hydroxyl group into a terminal of a perfluoropolyether derivative corresponding to the Rf-PFPE-moiety as a raw material, and subjecting it to Williamson reaction with a compound having a group corresponding to the —Y-A moiety, for example, a compound having a halogenated alkyl group at the terminal.

Alternatively, the compound can be produced by synthesizing a compound having a precursor group corresponding to the Y-A moiety, and converting the precursor to the Y-A moiety by using a method known in the art.

The method for converting is not particularly limited. For example, a known reaction for forming a carbon-carbon unsaturated bond, for example an elimination reaction such as dehydration reaction or dehydrohalogenation reaction, or a known method for adding a compound having a carbon-carbon unsaturated bond to a terminal of the molecular corresponding the Y-A moiety or substituting the terminal by the compound having a carbon-carbon unsaturated bond can be used. Those skilled in the art can select a suitable reaction and its reaction condition depending on a structure of the compound.

Formulae (C1) and (C2):

(Rf-PFPE)_(γ′)—X⁴—(SiR^(a) _(k)R^(b) _(l)R^(c) _(m)R^(d) _(n))_(γ)  (C1)

(SiR^(a) _(k)R^(b) _(l)R^(c) _(m)R^(d) _(n))_(γ)—X⁴-PFPE-X⁴—(SiR^(a) _(k)R^(b) _(l)R^(c) _(m)R^(d) _(n))_(γ)  (C2)

In the formulae (C1) and (C2), Rf and PFPE are defined as that for the formulae (A1) and (A2).

In the formula, X⁴ is each independently a single bond or a 2-10 valent organic group. The X⁴ group is recognized to be a linker which connects between a perfluoropolyether moiety (an Rf-PFPE moiety or -PFPE-moiety) providing mainly water-repellency, surface slip property and the like and a group having a carbon-carbon unsaturated bond (specifically, the A group or a group containing the A group (—SiR^(a) _(k)R^(b) _(l)R^(c) _(m)R^(d) _(n) group)) providing an ability to bind to a base material in the compound of the formula (C1) and (C2). Therefore, the X⁴ group may be any organic group as long as the compound of the formula (C1) and (C2) can stably exist.

In the formula, γ is an integer of 1-9, and γ′ is an integer of 1-9. γ and γ′ are determined depending on the valence number of the X⁴ group. In the formula (C1), the sum of γ and γ′ is the valence number of the X⁴ group. For example, when X⁴ is a 10 valent organic group, the sum of γ and γ′ is 10, for example, γ is 9 and γ′ is 1, γ is 5 and γ′ is 5, or γ is 1 and γ′ is 9. When X⁴ is a divalent organic group, γ and γ′ are 1. In the formula (C2), γ is a value obtained by subtracting 1 from the valence number of the X⁴ group.

X⁴ is preferably a 2-7 valent, more preferably 2-4 valent, more preferably a divalent organic group.

Examples of X⁴ include, but are not particularly limited to, the same group as that for X¹.

In the formula, R^(a) is each independently at each occurrence —Z—SiR⁷¹ _(p)R⁷² _(q)R⁷³ _(r)R⁷⁴ _(s).

In the formula, Z is each independently at each occurrence an oxygen atom or a divalent organic group.

Preferably, Z is a divalent organic group. Z does not include a group which forms a siloxane bond together with a Si atom (Si atom to which R^(a) attaches) present in the end of the molecular backbone of the formula (C1) or the formula (C2).

Z is preferably, a C₁₋₆ alkylene group, —(CH₂)_(g)—O—(CH₂)_(h)— wherein g is an integer of 0-6, for example, an integer of 1-6, h is an integer of 0-6, for example, an integer of 1-6, or -phenylene-(CH₂)_(i)— wherein i is an integer of 0-6, more preferably a C₁₋₃ alkylene group. These groups may be substituted by one or more substituents selected from, for example, a fluorine atom, a C₁₋₆ alkyl group, a C₂₋₆ alkenyl group, and a C₂₋₆ alkynyl group.

In the formula, R⁷¹ is each independently at each occurrence R^(a′). R^(a′) has the same definition as that of R^(a),

In R^(a), the number of Si atoms which are linearly connected via the Z group is up to five. That is, in R^(a), when there is at least one R⁷¹, there are two or more Si atoms which are linearly connected via the Z group in R^(a). The number of such Si atoms which are linearly connected via the Z group is up to five. It is noted that “the number of such Si atoms which are linearly connected via the Z group in R^(a)” is equal to the repeating number of —Z—Si— which are linearly connected in R^(a).

For example, one example in which Si atoms are connected via the Z group in R^(a) is shown below.

In the above formula, * represents a position binding to Si of the main backbone, and . . . represents that a predetermined group other than ZSi binds thereto, that is, when all three bonds of a Si atom are . . . , it means an end point of the repeat of ZSi. The number on the right shoulder of Si means the number of occurrences of Si which is linearly connected via the Z group from *. In other words, in the chain in which the repeat of ZSi is completed at Si², “the number of such Si atoms which are linearly connected via the Z group in R^(a)” is 2. Similarly, in the chain in which the repeat of ZSi is completed at Si³, Si⁴ and Si⁵, respectively, “the number of such Si atoms which are linearly connected via the Z group in R^(a)” is 3, 4 and 5. It is noted that as seen from the above formula, there are some ZSi chains, but they need not have the same length and may be have arbitrary length.

In a preferred embodiment, as shown below, “the number of such Si atoms which are linearly connected via the Z group in R^(a)” is 1 (left formula) or 2 (right formula) in all chains.

In one embodiment, the number of such Si atoms which are linearly connected via the Z group in R^(a) is 1 or 2, preferably 1.

In the formula, R⁷² is each independently at each occurrence —X⁵—Y-A. Y and A are as defined above.

X⁵ is each independently at each occurrence a single bond or a divalent organic group. X⁵ is preferably a single bond, a C₁₋₆ alkylene group, —(CH₂)_(g)—O—(CH₂)_(h)— (wherein g is an integer of 1-6, h is an integer of 1-6) or, -phenylene-(CH₂)_(i)— (wherein i is an integer of 0-6), more preferably a single bond or a C₁₋₃ alkylene group. These groups may be substituted by one or more substituents selected from, for example, a fluorine atom, a C₁₋₆ alkyl group, a C₂₋₆ alkenyl group, and a C₂₋₆ alkynyl group.

R⁷² is preferably —CH₂—CH═CH₂.

In the formula, R⁷³ is each independently at each occurrence a hydroxyl group or a hydrolyzable group.

The “hydrolyzable group” as used herein represents a group which is able to undergo a hydrolysis reaction. Examples of the hydrolyzable group include —OR, —OCOR, —O—N═C(R)₂, —N(R)₂, —NHR, halogen (wherein R is a substituted or non-substituted alkyl group having 1-4 carbon atoms), preferably —OR (an alkoxy group). Examples of R include a non-substituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a n-butyl group, an isobutyl group; a substituted alkyl group such as a chloromethyl group. Among them, an alkyl group, in particular a non-substituted alkyl group is preferable, a methyl group or an ethyl group is more preferable. The hydroxyl group may be, but is not particularly limited to, a group generated by hydrolysis of a hydrolyzable group.

Preferably, R⁷³ is —OR wherein R is a substituted or non-substituted C₁₋₃ alkyl group, more preferably a methyl group.

In the formula, R⁷⁴ is each independently at each occurrence a hydrogen atom or a lower alkyl group. The lower alkyl group is preferably an alkyl group having 1-20 carbon atoms, more preferably an alkyl group having 1-6 carbon atoms, more preferably a methyl group.

In the formula, p is each independently at each occurrence an integer of 0-3; q is each independently at each occurrence, an integer of 0-3; r is each independently at each occurrence an integer of 0-3; s is each independently at each occurrence an integer of 0-3. However, p+q+r+s (the sum of p, q, r and s) is 3.

In a preferably embodiment, in the terminal R^(a′) in R^(a) (when R^(a′) is absent, R^(a)), q is preferably 2 or more, for example 2 or 3, more preferably 3.

In the formula, R^(b) is each independently at each occurrence —X⁵—Y-A. X⁵, Y and A are as defined above. R^(b) is preferably —CH₂—CH═CH₂.

In the formula, R^(c) is each independently at each occurrence a hydroxyl group or a hydrolyzable group.

R^(c) is preferably a hydroxyl group, —OR, —OCOR, —O—N═C(R)₂, —N(R)₂, —NHR, halogen (wherein R is a substituted or non-substituted alkyl group having 1-4 carbon atoms), preferably —OR. R is a non-substituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a n-butyl group, an isobutyl group; a substituted alkyl group such as a chloromethyl group. Among them, an alkyl group, in particular a non-substituted alkyl group is preferable, a methyl group or an ethyl group is more preferable. The hydroxyl group may be, but is not particularly limited to, a group generated by hydrolysis of a hydrolyzable group. R^(c) is more preferably —OR wherein R is a substituted or non-substituted C₁₋₃alkyl group, more preferably methyl group.

In the formula, R^(d) is each independently at each occurrence a hydrogen atom or a lower alkyl group. The lower alkyl group is preferably an alkyl group having 1-20 carbon atoms, more preferably an alkyl group having 1-6 carbon atoms, further preferably methyl group.

In the formulae, k is each independently at each occurrence an integer of 0-3; 1 is each independently at each occurrence an integer of 0-3; m is each independently at each occurrence, an integer of 0-3; n is each independently at each occurrence an integer of 0-3. However, k+l+m+n (the sum of k, l, m and n) is 3.

In the formulae (C1) and (C2), in —(SiR^(a) _(k)R^(b) _(l)R^(c) _(m)R^(d) _(n))_(r), at least one Y-A group is present.

The compound of the formulae (C1) and (C2) can be obtained, for example, by introducing a —SiHal₃ group (Hal is a halogen) into a perfluoropolyether derivative corresponding to the Rf-PFPE-moiety by hydrosilylation, etc., and subjecting it to a reaction with a Grignard reagent corresponding to the —Y-A moiety, for example, Hal-Mg—CH₂—CH═CH₂, etc.

Alternatively, the compound can be produced by synthesizing a compound having a precursor group corresponding to the Y-A moiety, and converting the precursor to the Y-A moiety by using a method known in the art.

The method for converting is not particularly limited. For example, a known reaction for forming a carbon-carbon unsaturated bond, for example an elimination reaction such as dehydration reaction or dehydrohalogenation reaction, or a known method for adding a compound having a carbon-carbon unsaturated bond to a terminal of the molecular corresponding the Y-A moiety or substituting the terminal by the compound having a carbon-carbon unsaturated bond can be used. Those skilled in the art can select a suitable reaction and its reaction condition depending on a structure of the compound.

Formulae (D1) and (D2):

(R⁹¹—Rf′)_(δ′)—X⁶—(Y-A)_(δ)  (D1)

(A-Y)_(δ)—X⁶—Rf′—X⁶—(Y-A)_(δ)  (D2)

In the formulae (D1) and (D2), Y and A are defined as that for the formulae (A1) and (A2).

In the formula, X⁶ is each independently a single bond or a 2-10 valent organic group. The X⁶ group is recognized to be a linker which connects between a perfluoropolyether moiety (an R⁹¹—Rf′— or —Rf′—) providing mainly water-repellency, surface slip property and the like and a group having a carbon-carbon unsaturated bond (specifically, the A group or a group containing the A group) providing an ability to bind to a base material in the compound of the formula (D1) and (D2). Therefore, the X⁶ group may be any organic group as long as the compound of the formula (D1) and (D2) can stably exist.

In the formula, δ is an integer of 1-9, and is determined depending on the valence number of X⁶. For example, when X⁶ is a 10 valent organic group, δ is 9, and when X⁶ is a divalent organic group, δ is 1.

In the formula, δ is an integer of 1-9, and δ′ is an integer of 1-9. δ and δ′ are determined depending on the valence number of the X⁶ group. In the formula (D1), the sum of δ and δ′ is the valence number of the X⁶ group. For example, when X⁶ is a 10 valent organic group, the sum of δ and δ′ is 10, for example, δ is 9 and δ′ is 1, δ is 5 and δ′ is 5, or δ is 1 and δ′ is 9. When X⁶ is a divalent organic group, δ and δ′ are 1. In the formula (D2), δ is a value obtained by subtracting 1 from the valence number of the X⁶ group.

X⁶ is preferably a 2-7 valent, more preferably 2-4 valent, more preferably a divalent organic group.

Examples of X⁶ include, but are not particularly limited to, the same group as that for X¹.

In the formula, R⁹¹ is a fluorine atom, —CHF₂ or —CF₃, preferably a fluorine atom or —CF₃.

Rf′ is a perfluoroalkylene group having 1-20 carbon atoms. Rf′ has preferably 1-12 carbon atoms, more preferably 1-6 carbon atoms, further preferably 3-6 carbon atoms. Examples of the specific Rf′ include —CF₂—, —CF₂CF₂—, —CF₂CF₂CF₂—, —CF(CF₃)—, —CF₂CF₂CF₂CF₂—, —CF₂CF(CF₃)—, —C(CF₃)—, —(CF₂)₄CF₂—, —(CF₂)₂CF(CF₃)—, —CF₂C(CF₃)—, —CF(CF₃)CF₂CF₂CF₂—, —(CF₂)₅CF₂—, —(CF₂)₃CF(CF₃)₂, —(CF₂)₄CF(CF₃)₂, —C₈F₁₇. Among them, a straight perfluoroalkylene having 3-6 carbon atoms, for example, —CF₂CF₂CF₂CF₂—, —CF₂CF₂CF₂—, etc.

The compound of the formulae (D1) and (D2) can be obtained, for example, by introducing iodine into a terminal of a perfluoropolyether derivative corresponding to the Rf-PFPE-moiety as a raw material, and subjecting it to a dehydrohalogenation reaction, etc.

Alternatively, the compound can be produced by synthesizing a compound having a precursor group corresponding to the Y-A moiety, and converting the precursor to the Y-A moiety by using a method known in the art.

The method for converting is not particularly limited. For example, a known reaction for forming a carbon-carbon unsaturated bond, for example an elimination reaction such as dehydration reaction or dehydrohalogenation reaction, or a known method for adding a compound having a carbon-carbon unsaturated bond to a terminal of the molecular corresponding the Y-A moiety or substituting the terminal by the compound having a carbon-carbon unsaturated bond can be used. Those skilled in the art can select a suitable reaction and its reaction condition depending on a structure of the compound.

The surface-treating agent of the present invention may be diluted with a solvent, Examples of the solvent include, but are not particularly limited to, for example, a solvent selected from the group consisting of perfluorohexane, CF₃CF₂CHCl₂, CF₃CH₂CF₂CH₃, CF₃CHFCHFC₂F₅, 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorooctane, 1,1,2,2,3,3,4-heptafluorocyclopentane (ZEORORA H (trade name), etc.), C₄F₉OCH₃, C₄F₉OC₂H₅, CF₃CH₂OCF₂CHF₂, C₆F₁₃CH═CH₂, xylene hexafluoride, perfluorobenzene, methyl pentadecafluoroheptyl ketone, trifluoroethanol, pentafluoropropanol, hexafluoroisopropanol, HCF₂CF₂CH₂OH, methyl trifluoromethanesulfonate, trifluoroacetic acid and CF₃O(CF₂CF₂O)_(m)(CF₂O)_(n)CF₂CF₃ [wherein m and n are each independently an integer of 0 or more and 1000 or less, the occurrence order of the respective repeating units in parentheses with the subscript m or n is not limited in the formula, with the proviso that the sum of m and n is 1 or more.], 1,1-dichloro-2,3,3,3-tetrafluoro-1-propene, 1,2-dichloro-1,3,3,3-tetrafluoro-1-propene, 1,2-dichloro-3,3,3-trichloro-1-propene, 1,1-dichloro-3,3,3-trichloro-1-propene, 1,1,2-trichloro-3,3,3-trichloro-1-propene, 1,1,1,4,4,4-hexafluoro-2-butene. These solvents may be used alone or as a mixture of 2 or more compound.

The above-mentioned surface-treating agent may comprise other components in addition to a fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal. Examples of the other components include, but are not particularly limited to, for example, a (non-reactive) fluoropolyether compound which may be also understood as a fluorine-containing oil, preferably a perfluoro(poly)ether compound (hereinafter, referred to as “the fluorine-containing oil”), a (non-reactive) silicone compound which may be also understood as a silicone oil (hereinafter referred to as “a silicone oil”), a catalyst, and the like.

Examples of the above-mentioned fluorine-containing oil include, but are not particularly limited to, for example, a compound of the following general formula (3) (a perfluoro(poly)ether compound).

Rf¹—(OC₄F₈)_(a′)—(OC₃F₆)_(b′)—(OC₂F₄)_(c′)—(OCF₂)_(d′)—Rf²  (3)

In the formula, Rf¹ represents a C₁₋₁₆ alkyl group which may be substituted by one or more fluorine atoms (preferably, a C₁₋₁₆ perfluoroalkyl group), Rf² represents a C₁₋₁₆ alkyl group which may be substituted by one or more fluorine atoms (preferably, a C₁₋₁₆ perfluoroalkyl group), a fluorine atom or a hydrogen atom, and more preferably, Rf¹ and Rf² is each independently a C₁₋₃ perfluoroalkyl group.

Subscripts a′, b′, c′ and d′ represent the repeating number of each of four repeating units of perfluoropolyether which constitute a main backbone of the polymer, and are each independently an integer of 0 or more and 300 or less, and the sum of a′, b′, c′ and d′ is at least 1, preferably 1-300, more preferably 20-300. The occurrence order of the respective repeating units in parentheses with the subscript a′, b′, c′ or d′ is not limited in the formulae. Among these repeating units, the —(OC₄F₈)— group may be any of —(OCF₂CF₂CF₂CF₂)—, —(OCF(CF₃)CF₂CF₂)—, —(OCF₂CF(CF₃)CF₂)—, —(OCF₂CF₂CF(CF₃))—, —(OC(CF₃)₂CF₂)—, —(OCF₂C(CF₃)₂)—, —(OCF(CF₃)CF(CF₃))—, —(OCF(C₂F₅)CF₂)— and —(OCF₂CF(C₂F₅))—, preferably —(OCF₂CF₂CF₂CF₂). The —(OC₃F₆)— group may be any of —(OCF₂CF₂CF₂)—, —(OCF(CF₃)CF₂)— and —(OCF₂CF(CF₃))—, preferably —(OCF₂CF₂CF₂)—. The —(OC₂F₄)— group may be any of —(OCF₂CF₂)— and —(OCF(CF₃))—, preferably —(OCF₂CF₂)—.

Examples of the perfluoropolyether compound of the above general formula (3) include a compound of any of the following general formulae (3a) and (3b) (may be one compound or a mixture of two or more compounds).

Rf¹—(OCF₂CF₂CF₂)_(b″)—Rf²  (3a)

Rf¹—(OCF₂CF₂CF₂CF₂)_(a″)—(OCF₂CF₂CF₂)_(b″)—(OCF₂CF₂)_(c″)—(OCF₂)_(d″)—Rf²   (3b)

In these formulae:

Rf¹ and Rf² are as defined above; in the formula (3a), b″ is an integer of 1 or more and 100 or less; and in the formula (3b), a″ and b″ are each independently an integer of 1 or more and 30 or less, and c″ and d″ are each independently an integer of 1 or more and 300 or less. The occurrence order of the respective repeating units in parentheses with the subscript a″, b″, c″ or d″ is not limited in the formulae.

The above-mentioned fluorine-containing oil may have an average molecular weight of 1,000-30,000. By having such average molecular weight, high surface slip property can be obtained.

The fluorine-containing oil may be contained in the surface-treating agent of the present invention, for example, at 0-500 parts by mass, preferably 0-400 parts by mass, more preferably 5-300 parts by mass with respect to 100 parts by mass of the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal (as the total mass when two or more compounds are used; hereinafter the same shall apply).

The compound of the general formula (3a) and the compound of the general formula (3b) may be used alone or in combination. The compound of the general formula (3b) is preferable than the compound of the general formula (3a) since the compound of the general formula (3b) provides higher surface slip property than the compound of the general formula (3a). When they are used in combination, the ratio by mass of the compound of the general formula (3a) to the compound of the general formula (3b) is preferably 1:1 to 1:30, more preferably 1:1 to 1:10. By applying such ratio by mass, a perfluoropolyether group-containing silane-based coating which provides a good balance of surface slip property and friction durability can be obtained.

In one embodiment, the fluorine-containing oil comprises one or more compounds of the general formula (3b). In such embodiment, the mass ratio of the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal to the compound of the formula (3b) in the surface-treating agent is preferably 4:1 to 1:4.

In a preferable embodiment, when a surface-treating layer is formed by using vacuum deposition, an average molecular weight of the fluorine-containing oil may be higher than an average molecular weight of the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal. By selecting such average molecular weights, more excellent surface slip property and friction durability can be obtained.

From the other point of view, the fluorine-containing oil may be a compound of the general formula Rf³—F wherein Rf³ is a C₅₋₁₆ perfluoroalkyl group. In addition, the fluorine-containing oil may be a chlorotrifluoroethylene oligomer. The compound of Rf³—F or the chlorotrifluoroethylene oligomer is preferable because the compounds have high affinity for the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal wherein a terminal is a C₁₋₁₆ perfluoroalkyl group.

The fluorine-containing oil contributes to increasing of surface slip property of the surface-treating layer.

Examples of the above-mentioned silicone oil include, for example, a liner or cyclic silicone oil having 2,000 or less siloxane bonds. The liner silicone oil may be so-called a straight silicone oil and a modified silicon oil. Examples of the straight silicone oil include dimethylsilicone oil, methylphenylsilicone oil, and methylhydrogensilicone oil. Examples of the modified silicone oil include that which is obtained by modifying a straight silicone oil with alkyl, aralkyl, polyether, higher fatty acid ester, fluoroalkyl, amino, epoxy, carboxyl, alcohol, or the like. Examples of the cyclic silicone oil include, for example, cyclic dimethylsiloxane oil.

The silicone oil may be contained in the surface-treating agent of the present invention, for example, at 0-300 parts by mass, preferably 0-200 parts by mass with respect to 100 parts by mass of the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal (as the total mass when two or more compounds are used; hereinafter the same shall apply).

The silicone oil contributes to increasing of surface slip property of the surface-treating layer.

Examples of the above-mentioned catalyst include an acid (for example, acetic acid, trifluoroacetic acid, etc.), a base (for example, ammonia, triethylamine, diethylamine, etc.), a transition metal (for example, Ti, Ni, Sn, etc.), and the like.

When the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal has a hydrolyzable group, the catalyst facilitates hydrolysis and dehydration-condensation of the compound to facilitate a formation of the surface-treating layer.

The surface-treating agent of the present invention is impregnated into a porous material, for example, a porous ceramic material, a metal fiber for example that obtained by solidifying a steel wool to obtain a pellet. The pellet can be used, for example, in vacuum deposition.

By forming the surface-treating layer on a surface of the base material by using the surface-treating agent of the present invention, the surface-treating layer having high alkali resistance and having water-repellency, oil-repellency, antifouling property (for example, preventing from adhering a fouling such as fingerprints), waterproof property (preventing the ingress of water into an electrical member, and the like), surface slip property (or lubricity, for example, wiping property of a fouling such as fingerprints and excellent tactile feeling in a finger), ultraviolet resistance, and the like depending on a composition of the surface-treating agent used can be obtained.

The base material usable in the present invention may be composed of any suitable material such as an inorganic material (for example, a glass, sapphire glass), a resin (may be a natural or synthetic resin such as a common plastic material, specifically an acrylic resin, a polycarbonate resin, and may be in form of a plate, a film, or others), a metal (may be a simple substance of a metal such as aluminum, copper, or iron, or a complex such as alloy or the like), a ceramic, a semiconductor (silicon, germanium, or the like), a fiber (a fabric, a non-woven fabric, or the like), a fur, a leather, a wood, a pottery, a stone, an architectural member or the like.

For example, when an article to be produced is an optical member, a material constituting the surface of the base material may be a material for an optical member, for example, a glass or a transparent plastic. For example, when an article to be produced is an optical member, any layer (or film) such as a hard coating layer or an antireflection layer may be formed on the surface (for example, outermost layer) of the base material. As the antireflection layer, either a single antireflection layer or a multi antireflection layer may be used. Examples of an inorganic material usable in the antireflection layer include SiO₂, SiO, ZrO₂, TiO₂, TiO, Ti₂O₃, Ti₂O₅, Al₂O₃, Ta₂O₅, CeO₂, MgO, Y₂O₃, SnO₂, MgF₂, WO₃, and the like. These inorganic materials may be used alone or in combination with two or more (for example, as a mixture). When multi antireflection layer is formed, preferably, SiO₂ and/or SiO are used in the outermost layer. When an article to be produced is an optical glass part for a touch panel, it may have a transparent electrode, for example, a thin layer comprising indium tin oxide (ITO), indium zinc oxide, or the like on a part of the surface of the base material (glass). Furthermore, the base material may have an insulating layer, an adhesive layer, a protecting layer, a decorated frame layer (I-CON), an atomizing layer, a hard coating layer, a polarizing film, a phase difference film, a liquid crystal display module, and the like, depending on its specific specification.

The preferable base material is a glass or a sapphire glass. As the glass, a soda-lime glass, an alkali aluminosilicate glass, a borosilicate glass, a non-alkaline glass, a crystal glass, a quartz glass is preferable, a chemically strengthened soda-lime glass, a chemically strengthened alkali aluminosilicate glass, and a chemically strengthened borosilicate glass are more preferable.

The shape of the base material is not specifically limited. The region of the surface of the base material on which the surface-treating layer should be formed may be at least a part of the surface of the base material, and may be appropriately determined depending on use, the specific specification, and the like of the article to be produced.

In a preferable embodiment, the base material has a Si—H bond or a C—H bond on its surface.

The Si—H bond or the C—H bond may be introduced by pretreatment the surface of the base material0. For example, the Si—H bond or the C—H bond can be introduced by plasma-treating the surface of the base material.

The Si—H bond or the C—H bond can be introduced by forming a layer having a Si—H bond or a C—H bond on the surface of the base material. For example, the layer having a Si—H bond or a C—H bond can be formed on the surface of the base material by forming a layer of silicon dioxide on the surface of the base material and plasma-treating it, or forming a diamond-like carbon layer.

In one embodiment, the base material may have a hydroxyl group in addition to the Si—H bond or the C—H bond on the surface. By using such base material, for example, when the surface-treating agent having a Si atom to which a hydrolyzable group attaches in addition to the carbon-carbon unsaturated bond at the terminal is used, the surface-treating layer can be bonded to the base material more strongly.

A method for forming the surface-treating layer on the surface of the base material includes, for example, the following methods.

The formation of the surface-treating layer can be performed by applying the above surface-treating agent on the surface of the base material such that the surface-treating agent coats the surface. The method of coating is not specifically limited. For example, a wet coating method or a dry coating method can be used.

Examples of the wet coating method include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating, and a similar method.

Examples of the dry coating method include deposition (usually, vacuum deposition), sputtering, CVD and a similar method. The specific examples of the deposition method (usually, vacuum deposition) include resistance heating, electron beam, high-frequency heating using microwave, etc., ion beam, and a similar method. The specific examples of the CVD method include plasma-CVD, optical CVD, thermal CVD and a similar method. The deposition method is will be described below in more detail.

Additionally, coating can be performed by an atmospheric pressure plasma method.

When the wet coating method is used, the surface-treating agent of the present invention is diluted with a solvent, and then it is applied to the surface of the base material. In view of stability of the surface-treating agent of the present invention and volatile property of the solvent, the following solvents are preferably used: a C₅₋₁₂ aliphatic perfluorohydrocarbon (for example, perfluorohexane, perfluoromethylcyclohexane and perfluoro-1,3-dimethylcyclohexane); an aromatic polyfluorohydrocarbon (for example, bis(trifluoromethyl)benzene); an aliphatic polyfluorohydrocarbon (for example, C₆F₁₃CH₂CH₃ (for example, ASAHIKLIN (registered trademark) AC-6000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (for example, ZEORORA (registered trademark) H manufactured by Nippon Zeon Co., Ltd.); hydrofluorocarbon (HFC) (for example, 1,1,1,3,3-pentafluorobutane (HFC-365mfc)); hydrochlorofluorocarbon (for example, HCFC-225 (ASAHIKLIN (registered trademark) AK225)); a hydrofluoroether (HFE) (for example, an alkyl perfluoroalkyl ether such as perfluoropropyl methyl ether (C₃F₇OCH₃) (for example, Novec (trademark) 7000 manufactured by Sumitomo 3M Ltd.), perfluorobutyl methyl ether (C₄F₉OCH₃) (for example, Novec (trademark) 7100 manufactured by Sumitomo 3M Ltd.), perfluorobutyl ethyl ether (C₄F₉OC₂H₅) (for example, Novec (trademark) 7200 manufactured by Sumitomo 3M Ltd.), and perfluorohexyl methyl ether (C₂F₅CF(OCH₃)C₃F₇) (for example, Novec (trademark) 7300 manufactured by Sumitomo 3M Ltd.) (the perfluoroalkyl group and the alkyl group may be liner or branched)), or CF₃CH₂OCF₂CHF₂ (for example, ASAHIKLIN (registered trademark) AE-3000 manufactured by Asahi Glass Co., Ltd.), 1,2-dichloro-1,3,3,3-tetrafluoro-1-propene (for example, VERTREL (registered trademark) Sion manufactured by Du Pont-Mitsui Fluorochemicals Co., Ltd.) and the like. These solvents may be used alone or as a mixture of 2 or more compound. Among them, the hydrofluoroether is preferable, perfluorobutyl methyl ether (C₄F₉OCH₃) and/or perfluorobutyl ethyl ether (C₄F₉OC₂H₅) are particularly preferable. Furthermore, the solvent can be mixed with another solvent, for example, to adjust solubility of the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal.

When the dry coating method is used, the surface-treating agent of the present invention may be directly subjected to the dry coating method, or may be diluted with a solvent, and then subjected to the dry coating method.

In one embodiment, the formation of the film is preferably performed so that the surface-treating agent of the present invention is present together with a catalyst for a reaction with the base material, for example, a reaction with the Si—H bond or the C—H bond of the base material. Simply, when the wet coating method is used, after the surface-treating agent of the present invention is diluted with a solvent, and just prior to applying it to the surface of the base material, the catalyst may be added to the diluted solution of the surface-treating agent of the present invention. When the dry coating method is used, the surface-treating agent of the present invention to which a catalyst has been added is used itself in deposition (usually, vacuum deposition), or pellets may be used in the deposition (usually, the vacuum deposition), wherein the pellets is obtained by impregnating a porous metal with the surface-treating agent of the present invention to which the catalyst has been added. Alternatively, before the surface-treating agent is provided on the surface of the base material, the catalyst may be present on the surface of the base material.

The catalyst is not particularly limited. For example, a metal catalyst, in particular platinum, palladium, rhodium, or ruthenium can be used, platinum is particularly preferred.

The film is post-treated as necessary. By performing the post-treatment, the bond between the surface-treating layer and the base material can be more strength and the durability is increased. The post-treatment is not particularly limited, and may be a thermal treatment. A temperature of the post-treatment is not particularly limited, and is 60° C. or more, preferably 100° C. or more, and a temperature at which the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal is not decomposed or less, for example, 250° C. or less, preferably 180° C. or less. The post-treatment is performed preferably under an inert atmosphere, more preferably under vacuum.

In a preferable embodiment, before the surface of the base material is treated with the surface-treating agent, a concave portion may be formed on the surface of the base material. By forming the concave portion on the surface of the base material, when the surface of the base material is treated with the surface-treating agent, the surface-treating agent is filled in the concave portion. The surface-treating agent filled in the concave portion can sustain the function of the surface-treating agent for more long term because when the surface-treating layer is wasted by abrasion during the use, the surface-treating agent filled in the concave portion function so as to supplement the surface-treating agent wasted.

A shape, size and quantity of the concave portion are not particularly limited. It is preferable that the surface state of the base material after the concave portion is formed and before the surface-treating agent is applied is a state where Rmax (maximum height) of the surface of the base material is about 10-50 times, preferably 20-40 times Ra (center line average roughness). It is noted that Ra and Rmax are defined in JIS B0601:1982.

Furthermore, when transparency of the base material is required, Ra is preferably 60 nm or less, more preferably 40 nm or less. By setting Ra to about 1/10 or less of the wavelength of visible light, the transparency of the base material can be ensured.

A method of forming concave portion on the surface of the base material is not particularly limited, and either chemical or physical method may be used, in particular, etching, sputtering or the like can be used.

In a preferable embodiment, the surface-treating layer is formed by performing a pretreatment of the base material so as to form a binding site with a compound in the surface-treating agent used on the surface of the base material; and applying the surface-treating agent of the present invention to the base material subjected to the pretreatment to form the surface-treating layer on the surface of the base material.

Therefore, the present invention provides a method for forming a surface-treating layer on a surface of a base material comprising the steps of:

performing a pretreatment of the base material so as to form a binding site with a carbon-carbon unsaturated bond on the surface of the base material; and

applying the surface-treating agent of the present invention to the base material subjected to the pretreatment to form the surface-treating layer on the surface of the base material.

Additionally, the present invention provides an apparatus for performing the method described above, that is, a surface-treating layer forming apparatus for forming a surface-treating layer on a surface of the base material comprising:

a pretreatment unit for performing a pretreatment of the base material to form a binding site with a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal on the surface of the base material, and

a surface-treating layer forming unit for applying the surface-treating agent of the present invention to the base material subjected to the pretreatment to form the surface-treating layer on the surface of the base material.

Hereinafter, the method for forming a surface-treating layer and the apparatus for forming the surface-treating layer of the present invention will be described with reference to the drawings.

FIG. 1 is a block diagram showing one embodiment of a surface-treating layer forming apparatus for forming the surface-treating layer on a base material. FIG. 2 is a cross-sectional view schematically showing one embodiment of the pretreatment unit 200.

As shown in FIG. 1, the surface-treating layer forming apparatus 100 comprises a pretreatment unit 200 for performing the pretreatment of the base material, a surface-treating layer forming unit 300 for forming the surface-treating layer on the base material after the pretreatment, a base material transporting unit 400 for transport the base material to the pretreatment unit 200 and the surface-treating layer forming unit 300, a base material importing and exporting unit 500 for importing and exporting the base material, and a control unit 600 for controlling each component of the surface-treating layer forming apparatus 100. The surface-treating layer forming apparatus 100 is structured as a multi-chamber type apparatus. The base material transporting unit 400 comprises a transporting chamber which is maintained in vacuum, and a base material transporting mechanism provided in the transporting chamber. The base material importing and exporting unit 500 comprises a base material holding part and a load-lock chamber, and transports the base material in the base material holding part into the load-lock chamber, and import and export the base material via the load-lock chamber.

The pretreatment unit 200 performs the pretreatment to form a binding site with a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal on the surface of the base material. In a preferable embodiment, the pretreatment unit 200 performs a surface treatment of the base material to bring a surface state of the base material on which the surface-treating layer will be formed to a state where a surface-treating layer having high density can be formed by the surface-treating agent to be used, and is structured as a plasma treating equipment for controlling amounts of O and H on the surface of the base material 220 in the embodiment.

The pretreatment unit 200 comprises a chamber 201, a base material holder 202 for holding the base material 220 in the chamber 201, a plasma generating unit 203 for generating a plasma and providing the plasma in the chamber 201, and an exhaust mechanism 204 for evacuating the chamber 201.

An importing and exporting port 211 which communicates with the transporting chamber and imports and exports the base material 220 is provided on a side wall of the chamber 201. The importing and exporting port 211 can be opened and closed by a gate valve 212.

The plasma generating unit 203 is supplied with a treatment gas containing a hydrogen gas, and generates the plasma containing hydrogen by a suitable method such as a microwave plasma, a inductively coupled plasma, a capacitively coupled plasma, or the like and supplies it in the chamber 201.

The exhaust mechanism 204 comprises an exhaust pipe 213 connected to lower portion the chamber 201, a pressure adjustment valve 214 provided in the exhaust pipe 213, and a vacuum pump 215 for exhausting the chamber 201 via the exhaust pipe 213.

In the embodiment, the surface of the base material 220 is treated with the plasma by holding the base material 220 on the base material holder 202, maintaining a predetermined vacuum pressure in the chamber 201, and supplying the plasma containing hydrogen to the chamber 201 from the plasma generating unit 203 under such state. Examples of the plasma containing hydrogen include, for example, a plasma containing a hydrogen gas and a rare gas (for example, helium, neon, argon, krypton or xenon) or a hydrogen alone plasma.

Next, SAM is formed on the surface of the base material 220 as the surface-treating layer by transferring the base material surface-treated in the pretreatment unit 200 to an organic molecule film forming unit 300, and supplying a SAM material gas to a vicinity of the base material 220.

The control unit 600 comprises a controller provided with a microprocessor (a computer) controlling each component of the apparatus 100. The controller can control, for example, an output, a gas flow rate, and a vacuum level in the pretreatment unit 200, and a flow rate of a carrier gas, a vacuum level of the surface-treating layer forming unit 300. The controller is connected to a user interface including a keyboard that an operator inputs commands for managing the apparatus 100 and a display for displaying visualized images of the operational states of the apparatus 100. The controller is connected to a storage unit that stores control programs for realizing various processes in the surface treatment performed in the apparatus 100 under the control of the controller, process recipes for respective components of the apparatus 100 to perform the processes based on the processing conditions, and various databases. The process recipe is stored in a suitable storage medium in the storage unit. If necessary, by reading the arbitrary process recipe from the storage unit and executing the process on the controller, the desired process is performed in the apparatus 100 under the control of the controller.

The base material used in the method for forming the surface-treating layer and the apparatus for forming the surface-treating layer is not particularly limited, but is preferably a base material having a network structure of Si and O at least on its surface. Examples of the base material include, for example, a glass. By using the base material, it is facilitated to form the S—H bond on the surface of the base material by the pretreatment.

Therefore, in a preferable embodiment, the present invention also provides:

a method for forming a surface-treating layer on a surface of a base material having a network structure of Si and O at least on its surface comprising the steps of

performing a pretreatment so as to form a Si—H bond on the surface of the base material; and

applying the surface-treating agent comprising the fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal to the base material subjected to the pretreatment to form the surface-treating layer on the surface of the base material; and

a process for producing an article comprising a base material and a surface-treating layer coating a surface of the base material comprising a step of:

contacting the surface-treating agent of the present invention to the surface of the base material so that the fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal contained in the surface-treating agent is reacted with a Si—H part or a C—H part of the surface of the base material to form the surface-treating layer on the surface of the base material.

Since the surface-treating agent of the present invention contains the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal, the surface-treating agent of the present invention can form the surface-treating layer as long as the binding site with carbon-carbon unsaturated bond is present in the surface of the base material. Therefore, the pretreatment has only to be able to form the Si—H bond on the surface of the base material. For example, a hydrogen atom treatment or a thermal treatment under hydrogen atmosphere, described below, may be performed as the pretreatment.

Hydrogen Atom Treatment

A hydrogen gas of about 1×10⁻⁴ Pa is supplied to a vacuum chamber having ultra-high vacuum (not more than 1×10⁻⁶ Pa). The hydrogen molecular is cleaved by thermal electrons or plasma into hydrogen atoms, and the hydrogen atom is absorbed on the surface of the base material.

Thermal Treatment Under Hydrogen Atmosphere

Hydrogen vacuum condition (in particular, hydrogen atmosphere of not more than 10⁻⁶ Pa) is made by flowing hydrogen as a carrier gas during vacuum drawing to substitute the atmosphere of the chamber with the hydrogen gas. Hydrogen is absorbed on the surface of the base material by heating the base material is heated to about 100-400° C. under the above atmosphere.

By using the method for forming the surface-treating layer or the apparatus for forming the surface-treating layer, an organic monolayer, preferably a self-assembled monolayer can be formed as the surface-treating layer on the surface of the base material.

In another embodiment, instead of the above pretreatment, a layer having the Si—H bond or the C—H bond may be formed on surface of the base material. For example, by forming a silicon dioxide on the surface of the base material, and performing the plasma treatment as described above, or by forming a diamond-like carbon layer, the layer having the Si—H bond or the C—H bond can be formed on the surface of the base material.

As described above, the surface-treating layer derived from the film of the surface-treating agent of the present invention is formed on the surface of the base material to produce the article of the present invention.

Therefore, the article of the present invention comprises a base material and a layer which is formed on a surface of the base material from the surface-treating agent (the surface-treating layer).

The present invention provides also a process for producing an article comprising a base material and a surface-treating layer coating a surface of the base material comprising a step of:

contacting the surface-treating agent of the present invention to the surface of the base material so that the fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal contained in the surface-treating agent is reacted with a Si—H part or a C—H part of the surface of the base material to form the surface-treating layer on the surface of the base material.

Since the surface-treating layer obtained by the present invention described above is bonded to the base material by the Si—C bond or the C—C bond, the surface-treating layer has high resistance to alkaline and ultraviolet in addition to high physical strength. In addition, the surface-treating layer obtained by the present invention may have water-repellency, oil-repellency, antifouling property (for example, preventing from adhering a fouling such as fingerprints), surface slip property (or lubricity, for example, wiping property of a fouling such as fingerprints and excellent tactile feeling in a finger) depending on a composition of the surface-treating agent used, thus may be suitably used as a functional thin film.

Therefore, the present invention further provides an optical material having the hardened material on the outermost layer.

Examples of the optical material include preferably a variety of optical materials in addition to the optical material for displays, or the like exemplified in below: for example, displays such as a cathode ray tube (CRT; for example, TV, personal computer monitor), a liquid crystal display, a plasma display, an organic EL display, an inorganic thin-film EL dot matrix display, a rear projection display, a vacuum fluorescent display (VFD), a field emission display (FED; Field Emission Display), or a protective plate of such displays, or that in which these displays and protective plates have been subjected to antireflection treatment on their surface.

The article having the surface-treating layer obtained according to the present invention is not specifically limited to, but may be an optical member. Examples of the optical member include the followings: lens of glasses, or the like; a front surface protective plate, an antireflection plate, a polarizing plate, or an anti-glare plate on a display such as PDP and LCD; a touch panel sheet of an instrument such as a mobile phone or a personal digital assistance; a disk surface of an optical disk such as a Blu-ray disk, a DVD disk, a CD-R or MO; an optical fiber; a display surface of a watch, and the like.

The article having the surface-treating layer obtained according to the present invention may be also a medical equipment or a medical material.

The thickness of the surface-treating layer is not specifically limited. For the optical member, the thickness of the surface-treating layer is within the range of 1-50 nm, 1-30 nm, preferably 1-15 nm, in view of optical performance, surface slip property, friction durability and antifouling property.

S Hereinbefore, the article produced by using the surface-treating agent of the present invention is described in detail. It is noted that an application, a method for using or a method for producing the article are not limited to the above exemplification.

Example 1

Formation of surface-treating layer A glass was prepared as the base material, and the surface of the glass was plasma-treated to form the Si—H bond on the surface of the glass. The surface-treating layer was formed on the surface of the glass treated by using the surface-treating agent containing a fluorine-containing compound having the following average composition by vacuum deposition under the following condition.

Fluorine-containing compound:

CF₃CF₂CF₂O(CF₂CF₂CF₂O)_(n)CF₂CF₂OCH₂CH═CH₂

wherein n is an integer of 20.

Vacuum Deposition Conditions

Equipment vacuum level: 1E-5 Pa

Temperature of the compound at the time of deposition: 200° C.

Temperature of the base material: room temperature (not controlled)

Deposition time: 10 minutes

After the vacuum deposition, the formation of CF_(x) layer was confirmed based on the observation of orbital energy spectrum of C1s of the surface-treating layer by using X-ray photoelectron spectroscopy (XPS). In addition, the static water contact angle of the surface-treating layer was measured for 5 μL of water at 25° C. by using a contact angle measuring instrument (manufactured by KYOWA INTERFACE SCIENCE Co., Ltd.). The result was not less than 110°.

Examination Example 1 (Alkali Resistance Test)

An aqueous alkaline solution (25 wt % of aqueous KOH solution at pH 14) was added dropwise on the surface of the glass on which the surface-treating layer formed as described above, and then the glass was allowed to stand for 30 minutes. Then, the surface-treating layer was observed by using a XPS analysis. Chemical changes in the surface-treating layer could not be observed 30 minutes after the adding dropwise of the aqueous alkaline solution since a peak shift of C1s orbital was changed. In addition, the static water contact angle was measured as described above. The result was not less than 110°.

Examination Example 2 (Artificial Perspiration Test)

An alkaline artificial perspiration defined in JIS L 0848 “Test method for color fastness to perspiration” was added dropwise on the surface of the glass on which the surface-treating layer formed as described above, and then the glass was allowed to stand for 2 hours. Then, a thickness of the surface-treating layer was measured by using an ellipsometer. The thickness change before and after the adding dropwise of the artificial perspiration was not more than 1 nm, thus, deterioration of the layer by the perspiration was not observed.

In addition, the surface-treating layers before and after the adding dropwise was observed by using a XPS analysis. Chemical changes in the surface-treating layer could not be observed 2 hours after the adding dropwise of the artificial perspiration since a peak shift of C1s orbital was changed. In addition, the static water contact angle was measured as described above. The result was not less than 110°.

From the above results, it was confirmed that the surface-treating layer having high alkali resistance and high perspiration resistance can be formed by using the surface-treating agent of the present invention.

INDUSTRIAL APPLICABILITY

The present invention can be suitably used for forming the surface-treating layer on a surface of a base material, in particular an optical member.

EXPLANATION OF THE REFERENCE NUMERALS

-   100: surface-treating layer forming apparatus -   200: pretreatment unit -   300: surface-treating layer forming unit -   400: base material transporting unit -   500: base material importing and exporting unit -   600: control unit -   201: chamber -   202: base material holder -   203: plasma generating unit -   204: exhaust mechanism -   211: importing and exporting port -   212: gate valve -   213: exhaust pipe -   214: pressure adjustment valve -   215: vacuum pump -   220: base material 

1. A surface-treating agent for treating a glass base material having a Si—H bond on the surface, comprising a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal as a group of —Y-A wherein Y is a single bond, an oxygen atom or a divalent organic group, and A is —CH═CH₂ or —C≡CH, wherein the fluorine-containing compound binds to the glass base material by a Si—C bond.
 2. The surface-treating agent according to claim 1 wherein the fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal is at least one compound of any of the following formulae (A1), (A2), (B1), (B2), (C1), (C2), (D1) and (D2):

wherein: A is each independently at each occurrence —CH═CH₂ or —C≡CH; Y is each independently at each occurrence a single bond, an oxygen atom or a divalent organic group; Rf is each independently an alkyl group having 1-16 carbon atoms which may be substituted by one or more fluorine atoms; PFPE is each independently —(OC₄F₈)_(a)—(OC₃F₆)_(b)—(OC₂F₄)_(c)—(OCF₂)_(d)—, wherein a, b, c and d are each independently an integer of 0 or more and 200 or less, the sum of a, b, c and d is 1 or more, and the occurrence order of the respective repeating units in parentheses with the subscript a, b, c or d is not limited in the formula; R¹¹ is each independently a hydrogen atom or a halogen atom; R¹² is each independently at each occurrence a hydrogen atom or a lower alkyl group; X¹ is each independently a single bond or a 2-10 valent organic group; X² is each independently at each occurrence a single bond or a divalent organic group; t is each independently an integer of 1-10; α is each independently an integer of 1-9; α′ is each independently an integer of 1-9; X³ is each independently a single bond or a 2-10 valent organic group; β is each independently an integer of 1-9; β′ is each independently an integer of 1-9; X⁴ is each independently a single bond or a 2-10 valent organic group; γ is each independently an integer of 1-9; γ′ is each independently an integer of 1-9; R^(a) is each independently at each occurrence —Z—SiR⁷¹ _(p)R⁷² _(q)R⁷³ _(r)R⁷⁴ _(s); Z is each independently at each occurrence an oxygen atom or a divalent organic group; R⁷¹ is each independently at each occurrence R^(a′); R^(a′) has the same definition as that of R^(a); in R^(a), the number of Si atoms which are straightly linked via the Z group is up to five; R⁷² is each independently at each occurrence —X⁵—Y-A; X⁵ is each independently at each occurrence a single bond or a divalent organic group; R⁷³ is each independently at each occurrence a hydroxyl group or a hydrolyzable group; R⁷⁴ is each independently at each occurrence a hydrogen atom or a lower alkyl group; p is each independently at each occurrence an integer of 0-3; q is each independently at each occurrence an integer of 0-3; r is each independently at each occurrence an integer of 0-3; s is each independently at each occurrence an integer of 0-3; with the proviso that (p+q+r+s) is 3; R^(b) is each independently at each occurrence —X⁵—Y-A; R^(c) is each independently at each occurrence a hydroxyl group or a hydrolyzable group; R^(d) is each independently at each occurrence a hydrogen atom or a lower alkyl group; k is each independently at each occurrence an integer of 0-3; l is each independently at each occurrence an integer of 0-3; m is each independently at each occurrence an integer of 0-3; n is each independently at each occurrence an integer of 0-3; with the proviso that (k+l+m+n) is 3, and there is at least one the Y-A group in —(SiR^(a) _(k)R^(b) _(l)R^(c) _(m)R^(d) _(n))_(r); X⁶ is each independently a single bond or a 2-10 valent organic group; δ is each independently an integer of 1-9; δ′ is each independently an integer of 1-9; R⁹¹ is a fluorine atom, —CHF₂ or —CF₃; and Rf′ is a perfluoroalkylene group having 1-20 carbon atoms.
 3. The surface-treating agent according to claim 1 wherein A is —CH═CH₂.
 4. The surface-treating agent according to claim 1 wherein Y is a single bond, an oxygen atom or —CR¹⁴ ₂—, and R¹⁴ is a hydrogen atom or a lower alkyl group.
 5. The surface-treating agent according to claim 2 wherein Rf is a perfluoroalkyl group having 1-16 carbon atoms.
 6. The surface-treating agent according to claim 2 wherein PFPE is a group of any of the following formulae (a)-(c): —(OC₃F₆)_(b)—  (a) in the formula (a), b is an integer of 1 or more and 200 or less; —(OC₄F₈)_(a)—(OC₃F₆)_(b)—(OC₂F₄)_(c)—(OCF₂)_(d)—  (b) in the formula (b), a and b is each independently an integer of 0 or more and 30 or less, c and d is each independently an integer of 1 or more and 200 or less, the sum of a, b, c and d is an integer of 10 or more and 200 or less, and the occurrence order of the respective repeating units in parentheses with the subscript a, b, c or d is not limited in the formula, and —(OC₂F₄—R¹⁵)_(n″)—  (c) in the formula (c), R¹⁵ is each independently a group selected from OC₂F₄, OC₃F₆ and OC₄F₈, and n″ is an integer of 2-100.
 7. The surface-treating agent according to claim 2 wherein in PFPE: OC₄F₈ is OCF₂CF₂CF₂CF₂, OC₃F₆ is OCF₂CF₂CF₂, and OC₂F₄ is OCF₂CF₂.
 8. The surface-treating agent according to claim 2 wherein X¹, X³, X⁴ and X⁶ are a 2-4 valent organic group, α, β, γ and δ are 1-3, and α′, β′, γ′ and δ′ are
 1. 9. The surface-treating agent according to claim 2 wherein X¹, X³, X⁴ and X⁶ are a divalent organic group, α, β, γ and δ are 1, and α′, β′, γ′ and δ′ are
 1. 10. The surface-treating agent according to claim 2 wherein X¹, X³, X⁴ and X⁶ are each independently —(R³¹)_(p′)—(X^(a))_(q′)—R³²— wherein: R³¹ is a single bond, —(CH₂)_(s′)— (wherein s′ is an integer of 1-20) or an o-, m- or p-phenylene group; R³² is a single bond, —(CH₂)_(t′)— (wherein t′ is an integer of 1-20) or an o-, m- or p-phenylene group; X^(a) is —(X^(b))_(r′)— (wherein r′ is an integer of 1-10); X^(b) is each independently at each occurrence a group selected from the group consisting of —O—, —S—, an o-, m- or p-phenylene group, —C(O)O—, —Si(R³³)₂—, —(Si(R³³)₂O)_(m′)—Si(R³³)₂— (wherein m′ is an integer of 1-100), —CONR³⁴—, —O—CONR³⁴—, —NR³⁴— and —(CH₂)_(n′)— (wherein n′ is an integer of 1-20); R³³ is each independently at each occurrence a phenyl group, a C₁₋₆alkyl group or a C₁₋₆alkoxy group; R³⁴ is each independently at each occurrence a hydrogen atom, a phenyl group or a C₁₋₆alkyl group; p′ is 0 or 1; q′ is 0 or 1; at least one of p′ and q′ is 1, the occurrence order of the respective repeating units in parentheses with the subscript p′ or q′ is not limited in the formula; and R³¹, R³² and X^(a) may be substituted with one or more substituents selected from a fluorine atom, a C₁₋₃alkyl group and a C₁₋₃fluoroalkyl group.
 11. The surface-treating agent according to claim 2 wherein X¹, X³, X⁴ and X⁶ are each independently selected from the group consisting of: —CH₂O(CH₂)₂—, —CH₂O(CH₂)₃—, —CH₂O(CH₂)₆—, —CH₂O(CH₂)₃Si(CH₃)₂OSi(CH₃)₂(CH₂)₂—, —CH₂O(CH₂)₃Si(CH₃)₂OSi(CH₃)₂OSi(CH₃)₂(CH₂)₂—, —CH₂O(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₂Si(CH₃)₂(CH₂)₂—, —CH₂O(CH₂)₃Si(CH₃)₂O(Si(CH₃)₃Si(CH₃)₂(CH₂)₂—, —CH₂O(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₁₀Si(CH₃)₂(CH₂)₂—, —CH₂O(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₂₀Si(CH₃)₂(CH₂)₂—, —CH₂OCF₂CHFOCF₂—, —CH₂OCF₂CHFOCF₂CF₂—, —CH₂OCF₂CHFOCF₂CF₂CF₂—, —CH₂OCH₂CF₂CF₂OCF₂—, —CH₂OCH₂CF₂CF₂OCF₂CF₂—, —CH₂OCH₂CF₂CF₂OCF₂CF₂CF₂—, —CH₂OCH₂CF₂CF₂OCF(CF₃)CF₂OCF₂—, —CH₂OCH₂CF₂CF₂OCF(CF₃)CF₂OCF₂CF₂—, —CH₂OCH₂CF₂CF₂OCF(CF₃)CF₂OCF₂CF₂CF₂—, —CH₂OCH₂CHFCF₂OCF₂—, —CH₂OCH₂CHFCF₂OCF₂CF₂—, —CH₂OCH₂CHFCF₂OCF₂CF₂CF₂—, —CH₂OCH₂CHFCF₂OCF(CF₃)CF₂OCF₂—, —CH₂OCH₂CHFCF₂OCF(CF₃)CF₂OCF₂CF₂—, —CH₂OCH₂CHFCF₂OCF(CF₃)CF₂OCF₂CF₂CF₂— —CH₂OCH₂(CH₂)₇CH₂Si(OCH₃)₂OSi(OCH₃)₂(CH₂)₂Si(OCH₃)₂OSi(OCH₃)₂(CH₂)₂—, —CH₂OCH₂CH₂CH₂Si(OCH₃)₂OSi(OCH₃)₂(CH₂)₃—, —(CH₂)₂—, —(CH₂)₃—, —(CH₂)₄—, —(CH₂)₆—, —(CH₂)₂—Si(CH₃)₂—(CH₂)₂— —CONH—(CH₂)₃—, —CON(CH₃)—(CH₂)₃—, —CON(Ph)-(CH₂)₃— (wherein Ph is a phenyl group), —CONH—(CH₂)₆—, —CONH—(CH₃)—(CH₂)₆—, —CON(Ph)-(CH₂)₆— (wherein Ph is a phenyl group), —CONH—(CH₂)₂NH(CH₂)₃—, —CONH—(CH₂)₆NH(CH₂)₃—, —CH₂O—CONH—(CH₂)₃—, —CH₂O—CONH—(CH₂)₆—, —S—(CH₂)₃—, —(CH₂)₂S(CH₂)₃—, —CONH—(CH₂)₃Si(CH₃)₂OSi(CH₃)₂(CH₂)₂—, —CONH—(CH₂)₃Si(CH₃)₂OSi(CH₃)₂OSi(CH₃)₂(CH₂)₂—, —CONH—(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₂Si(CH₃)₂(CH₂)₂—, —CONH—(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₃Si(CH₃)₂(CH₂)₂—, —CONH—(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₁₀Si(CH₃)₂(CH₂)₂—, —CONH—(CH₂)₃Si(CH₃)₂O(Si(CH₃)₂O)₂₀Si(CH₃)₂(CH₂)₂— —C(O)O—(CH₂)₃—, —C(O)O—(CH₂)₆—, —CH₂—O—(CH₂)₃—Si(CH₃)₂—(CH₂)₂—Si(CH₃)₂—(CH₂)₂—, —CH₂—O—(CH₂)₃—Si(CH₃)₂—(CH₂)₂—Si(CH₃)₂—CH(CH₃)—, —CH₂—O—(CH₂)₃—Si(CH₃)₂—(CH₂)₂—Si(CH₃)₂—(CH₂)₃—, —CH₂—O—(CH₂)₃—Si(CH₃)₂—(CH₂)₂—Si(CH₃)₂—CH(CH₃)—CH₂—,


12. The surface-treating agent according to claim 2 wherein X¹ is —O—CFR¹³—(CF₂)_(e)—, R¹³ is a fluorine atom or a lower fluoroalkyl group, and e is 0 or
 1. 13. The surface-treating agent according to claim 2 wherein X² is —(CH₂)_(u)—, and u is an integer of 0-2.
 14. The surface-treating agent according to claim 2 wherein R⁹¹ is a fluorine atom or CF₃.
 15. The surface-treating agent according to claim 2 wherein the fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal is at least one compound of any of the formulae (A1) and (A2).
 16. The surface-treating agent according to claim 2 wherein the fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal is at least one compound of any of the formulae (B1) and (B2).
 17. The surface-treating agent according to claim 2 wherein the fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal is at least one compound of any of the formulae (C1) and (C2).
 18. The surface-treating agent according to claim 2 wherein the fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal is at least one compound of any of the formulae (D1) and (D2).
 19. The surface-treating agent according to claim 1 further comprising one or more components selected form a fluorine-containing oil, a silicone oil, and a catalyst.
 20. The surface-treating agent according to claim 19 wherein the fluorine-containing oil is one or more compounds of the formula (3): Rf¹—(OC₄F₈)_(a′)—(OC₃F₆)_(b′)—(OC₂F₄)_(c′)—(OCF₂)_(d′)—RF²  (3) wherein: Rf¹ is an alkyl group having 1-16 carbon atoms which may be substituted by one or more fluorine atoms; Rf² is an alkyl group having 1-16 carbon atoms which may be substituted by one or more fluorine atoms, a fluorine atom or a hydrogen atom; a′, b′, c′ and d′ are the repeating number of each of four repeating units of perfluoro(poly)ether which constitute a main backbone of the polymer, and are each independently an integer of 0 or more and 300 or less, the sum of a′, b′, c′ and d′ is 1 or more, and the occurrence order of the respective repeating units in parentheses with the subscript a′, b′, c′ and d′ is not limited in the formula.
 21. The surface-treating agent according to claim 19 wherein the fluorine-containing oil is one or more compounds of the formula (3a) or (3b): Rf¹—(OCF₂CF₂CF₂)_(b″)—Rf²  (3a) Rf¹—(OCF₂CF₂CF₂CF₂)_(a″)—(OCF₂CF₂CF₂)_(b″)—(OCF₂CF₂)_(c″)—(OCF₂)_(d″)—Rf²  (3b) wherein: Rf¹ is an alkyl group having 1-16 carbon atoms which may be substituted by one or more fluorine atoms; Rf² is an alkyl group having 1-16 carbon atoms which may be substituted by one or more fluorine atoms, a fluorine atom or a hydrogen atom; in the formula (3a), b″ is an integer of 1 or more and 100 or less; in the formula (3b), a″ and b″ are each independently an integer of 0 or more and 30 or less, and c″ and d″ are each independently an integer of 1 or more and 300 or less; and the occurrence order of the respective repeating units in parentheses with the subscript a″, b″, c″ or d″ is not limited in the formula.
 22. The surface-treating agent according to claim 1 further comprising a solvent.
 23. The surface-treating agent according to claim 1 which is used as an antifouling-coating agent or a water-proof coating agent.
 24. An article comprising a glass base material and a layer which is formed on a surface of the base material from the surface-treating agent according to claim
 1. 25. (canceled)
 26. The article according to claim 24 wherein the glass is a glass selected from the group consisting of a soda-lime glass, an alkali aluminosilicate glass, a borosilicate glass, a non-alkaline glass, a crystal glass and a quartz glass.
 27. (canceled)
 28. The article according to claim 24 which is an optical member.
 29. A method for forming a surface-treating layer on a surface of a glass base material comprising the steps of: performing a pretreatment of the base material so as to form a Si—H bond as a binding site with a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal on the surface of the base material; and applying the surface-treating agent according to claim 1 to the base material subjected to the pretreatment to form the surface-treating layer on the surface of the base material.
 30. The method for forming a surface-treating layer according to claim 29 wherein in the pretreatment, an amount of H and an amount of O on the surface of the base material are controlled with a plasma containing hydrogen depending on the surface-treating agent used.
 31. The method for forming a surface-treating layer according to claim 29 wherein the pretreatment is performed by using the plasma containing hydrogen, and a Si—H bond having a function as the binding site with the fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal is formed on the surface of the base material by the plasma.
 32. (canceled)
 33. The method for forming a surface-treating layer according to claim 29 wherein the pretreatment is performed by using the plasma containing hydrogen.
 34. The method for forming a surface-treating layer according to claim 29 wherein the pretreatment is performed by using a hydrogen and rare gas plasma or a hydrogen plasma.
 35. The method for forming a surface-treating layer according to claim 29 wherein in the pretreatment, a hydrogen gas is supplied into a chamber held in a vacuum state, the hydrogen gas is cleaved to hydrogen atoms with a thermo electron or the plasma, and the hydrogen atoms are absorbed on the surface of the base material in the chamber.
 36. The method for forming a surface-treating layer according to claim 29 wherein in the pretreatment, a chamber is brought to a vacuum state under a hydrogen atmosphere, and the base material is heated in the chamber so that the hydrogen atom is absorbed on the surface of the base material.
 37. (canceled)
 38. The method for forming a surface-treating layer according to claim 29 wherein the surface-treating layer is an organic monolayer.
 39. The method for forming a surface-treating layer according to claim 29 wherein the surface-treating layer is a self-assembled monolayer.
 40. A surface-treating layer forming apparatus for forming a surface-treating layer on a surface of a glass base material comprising: a pretreatment unit for performing a pretreatment of the base material to form a Si—H bond as a binding site with a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal on the surface of the base material, and a surface-treating layer forming unit for applying the surface-treating agent according to claim 1 to the base material subjected to the pretreatment to form the surface-treating layer on the surface of the base material.
 41. The surface-treating layer forming apparatus according to claim 40 wherein in the pretreatment unit, an amount of H and an amount of O on the surface of the base material are controlled with a plasma containing hydrogen depending on the surface-treating agent used.
 42. The surface-treating layer forming apparatus according to claim 40 wherein the pretreatment in the pretreatment unit is performed by using the plasma containing hydrogen, and a Si—H bond having a function as the binding site with the fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal on the surface of the base material is formed by the plasma.
 43. (canceled)
 44. The surface-treating layer forming apparatus according to claim 40 wherein the pretreatment in the pretreatment unit is performed by using the plasma containing hydrogen.
 45. The surface-treating layer forming apparatus according to claim 40 wherein the pretreatment in the pretreatment unit is performed by using a hydrogen and rare gas plasma or a hydrogen plasma.
 46. The surface-treating layer forming apparatus according to claim 40 wherein the pretreatment in the pretreatment unit is performed by supplying a hydrogen gas into a chamber held in a vacuum state, cleaving the hydrogen gas to hydrogen atoms with a thermo electron or a plasma, and absorbing the hydrogen atoms on the surface of the base material in the chamber.
 47. The surface-treating layer forming apparatus according to claim 40 wherein the pretreatment in the pretreatment unit is performed by bringing a chamber to a vacuum state under a hydrogen atmosphere, and heating the base material in the chamber so that the hydrogen atom is absorbed on the surface of the base material.
 48. (canceled)
 49. The surface-treating layer forming apparatus according to claim 40 wherein the surface-treating layer is an organic monolayer.
 50. The surface-treating layer forming apparatus according to claim 40 wherein the surface-treating layer is a self-assembled monolayer.
 51. A process for producing an article comprising a base glass material having a Si—H bond on the surface and a surface-treating layer coating a surface of the base material comprising a step of: contacting the surface-treating agent according to claim 1 to the surface of the base material so that the fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal contained in the surface-treating agent is reacted with a Si—H part of the surface of the base material to form the surface-treating layer on the surface of the base material.
 52. The process for producing according to claim 51 wherein the surface-treating layer is formed on the surface of the base material by the method according to claim
 29. 53. The process for producing according to claim 51 wherein the surface-treating layer is formed on the surface of the base material by using the surface-treating layer forming apparatus according to claim
 40. 54. The process for producing according to claim 51 wherein a Si—H bond is introduced on the surface of the base material by forming a layer having the Si—H bond. 